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Proceedings Paper

Multilayer coatings for x-ray optics made by distributed electron cyclotron resonance (DECR) plasma sputtering
Author(s): Peter Hoghoj; Eric Ziegler; Eike Lueken; Jean-Christophe Peffen; Andreas K. Freund
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Paper Abstract

Distributed electron cyclotron resonance (DECR) plasma sputtering was used for depositing W/Si multilayers for x-rya optics. The argon plasma used in the sputtering process was excited by the DECR method. The DECR argon plasma diffusing the middle of the deposition chamber was characterized with a Langmuir probe. The ionization rate was found to be 7 X 10-4. This allowed us to sputter W and Si with a large range of target bias values at low pressures. Deposited single layers and W/Si multilayers were characterized with grazing incidence x-ray reflectometry. As an illustration of the capabilities, data is shown for a W/Si multilayer with period d equals 3.0 nm and an interface roughness (sigma) < 0.47 nm.

Paper Details

Date Published: 4 November 1994
PDF: 7 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192080
Show Author Affiliations
Peter Hoghoj, European Synchrotron Radiation Facility (France)
Eric Ziegler, European Synchrotron Radiation Facility (France)
Eike Lueken, European Synchrotron Radiation Facility (France)
Jean-Christophe Peffen, European Synchrotron Radiation Facility (France)
Andreas K. Freund, European Synchrotron Radiation Facility (France)


Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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