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Proceedings Paper

Pulsed-laser deposition of x-ray optical layer stacks with atomically flat interfaces
Author(s): Hermann Mai; Reiner Dietsch; Thomas Holz; S. Voellmar; S. Hopfe; Roland Scholz; Peter Weissbrodt; Rhena Krawietz; B. Wehner; H. Eichler; H. Wendrock
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Paper Abstract

Pulsed laser deposition is described as a technique for the synthesis of multilayers showing X- ray optical quality. The state of the art is characterized by results that demonstrate a development of the instrument basis superior to that of conventional PLD systems. Multilayers of the Ni/C, Mo/Si- and W/C-types prove the versatility of the method and the output of layer stack characterization by HREM, SPM, XD, AES, XPS, ellipsometry and image processing ensures a high quality with regard to stack regularity, layer homogeneity and interface smoothness.

Paper Details

Date Published: 4 November 1994
PDF: 12 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192079
Show Author Affiliations
Hermann Mai, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
Reiner Dietsch, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
Thomas Holz, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
S. Voellmar, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
S. Hopfe, Max-Planck-Institut fuer Mikrostrukturphysik (Germany)
Roland Scholz, Max-Planck-Institut fuer Mikrostrukturphysik (Germany)
Peter Weissbrodt, JENOPTIK Technologie GmbH (Germany)
Rhena Krawietz, Technische Univ. Dresden (Germany)
B. Wehner, Technische Univ. Dresden (Germany)
H. Eichler, Institut fuer Festkoerper- und Werkstofforschung (Germany)
H. Wendrock, Institut fuer Festkoerper- und Werkstofforschung (Germany)


Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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