Share Email Print

Proceedings Paper

Development of transparent conductive ZnO by Rf magnetron sputtering
Author(s): Francesca Demichelis; C. F. Pirri; E. Tresso
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In the present work it is reported a study on ZnO:Al deposited by RF magnetron sputtering of Zn and Al cathodes, or ZnO and Al cathodes in Ar+O2 and Ar atmosphere respectively. In order to obtain high band-gap films transparent in the 300 - 1000 nm wavelength region and highly electrical conductive films, an optimization of the deposition parameters has been performed by the Robust Design Method. ZnO:Al films, with an average transmittance above 85% for about 5000 angstroms thickness and a resistivity of 2 10-3 (Omega) cm have been grown.

Paper Details

Date Published: 4 November 1994
PDF: 11 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192077
Show Author Affiliations
Francesca Demichelis, Politecnico di Torino (Italy)
C. F. Pirri, Politecnico di Torino (Italy)
E. Tresso, Politecnico di Torino (Italy)

Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

© SPIE. Terms of Use
Back to Top