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Proceedings Paper

Interpreting anisotropy and disturbances of optical properties of thin films in terms of layer microstructure
Author(s): Francois Flory; Jean-Pierre Borgogno; D. Endelema; Emmanuel Rausa; Herve Rigneault; Antonella Rizzo
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Paper Abstract

Consequences of the columnar microstructure of dielectric thin films deposited by conventional vacuum evaporation are discussed. A model associated with the columns is used together with in situ and in air measurements to show that the anisotropy of Ion Assisted Deposited TiO2 films changes with ion energy. Moreover TiO2 and Ta2O5 layers deposited by conventional evaporation present reversible disturbances of their optical properties when illuminated with high power flux. A model taking into account both thermal and nonlinear properties (localized optical Kerr type effect) of the prism coupler system is used to explain the measurements and to estimate the nonlinear refractive index coefficient of different thin films.

Paper Details

Date Published: 4 November 1994
PDF: 11 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192065
Show Author Affiliations
Francois Flory, ENSPM (France)
Jean-Pierre Borgogno, ENSPM (France)
D. Endelema, ENSPM (France)
Emmanuel Rausa, ENSPM (France)
Herve Rigneault, ENSPM (France)
Antonella Rizzo, Ctr. Nationale per la Richerca e Sviluppo Materiali (Italy)


Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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