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Proceedings Paper

Newly developed mask observation SEM JWS-7800
Author(s): Kazuhiro Honda; Hiroshi Shimada; S. Norioka; Tatsuya Matsuo
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Paper Abstract

Scanning electron microscopes (SEMs) are now coming into use as mask observation, metrology and defect inspection tools. Phase shift masks and X-ray masks are fabricated with several thin membranes on a substrate. In order to get 3D information about the membranes' structure, high tilt observation with high resolution is necessary. This paper describes a newly developed mask observation SEM (JWS-7800) which is intended for observation of various types of masks with high resolution, 10 nm at 1 kV acceleration, even at 60 degree(s) tilt angle.

Paper Details

Date Published: 3 November 1994
PDF: 9 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191960
Show Author Affiliations
Kazuhiro Honda, JEOL Ltd. (Japan)
Hiroshi Shimada, JEOL Ltd. (Japan)
S. Norioka, JEOL Ltd. (Japan)
Tatsuya Matsuo, JEOL Ltd. (Japan)

Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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