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Proceedings Paper

Soft-handed vacuum chuck
Author(s): Atsunobu Une; Masatoshi Oda; F. Omata; Akinori Shibayama
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Paper Abstract

A new soft-handed vacuum chuck has been developed to allow the precise measurement of the placement accuracies of X-ray masks and wafers, which are deformed by stresses in processes, because it is difficult to clamp them without deformation. This chuck is characterized by three vacuum pinpads. The pinpads make it possible to prevent lateral movement and a vacuum seal. Thus, a lateral clamping force bearing an acceleration of 0.3 g and clamping without deformation have been achieved. This chuck was used with a NIKON 3I laser interferometry coordinate-measuring machine allowing the placement accuracies of an X- ray mask and a reticle to be measured with good repeatability at less than 30 nm (3 (sigma) ).

Paper Details

Date Published: 3 November 1994
PDF: 11 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191959
Show Author Affiliations
Atsunobu Une, NTT Advanced Technology Corp. (Japan)
Masatoshi Oda, NTT Advanced Technology Corp. (Japan)
F. Omata, NTT LSI Labs. (Japan)
Akinori Shibayama, NTT LSI Labs. (Japan)


Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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