Share Email Print

Proceedings Paper

Novel defect inspection method for the LSI mask pattern data
Author(s): Touru Miyauchi; Kenichi Kobayashi; Kazumasa Shigematsu
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

It is difficult to inspect the accuracy of LSI mask pattern data processed with a data processing system and to decide whether logical operations and sizing have been performed correctly. We devised a method to inspect mask pattern data for reticle patterns. We compared two sets of mask pattern data, each set processed with a different algorithm. We monitored the system to check the design rules between the layers or for a single. To implement this method, we developed and combined two devices, PAVE and PATACON, and set up the New Conversion and Inspection System of Mask Pattern Data.

Paper Details

Date Published: 3 November 1994
PDF: 8 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191955
Show Author Affiliations
Touru Miyauchi, Fujitsu Ltd. (Japan)
Kenichi Kobayashi, Fujitsu Ltd. (Japan)
Kazumasa Shigematsu, Fujitsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

© SPIE. Terms of Use
Back to Top