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Proceedings Paper

Evolution of pellicles
Author(s): Naofumi Inoue; Hiroaki Nakagawa; Masahiro Kondou
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Paper Abstract

Along with the higher integration of LSI, an implementation of Pellicle as a dust proof on Mask is much more required. Under steady technological developments, such as shorter wave length KrF Excirner laser or Deep UV, Pellicle auto—mounter, and particle detector, the requirements for Pellicle are changing and becoming much more severe. Therefore, we would like to introduce the current pellicle status and the future emphases regarding three main aspects; particle, light transmission, and light resistance, respectively here under.

Paper Details

Date Published: 3 November 1994
PDF: 8 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191952
Show Author Affiliations
Naofumi Inoue, Mitsui Petrochemical Industries, Ltd. (Japan)
Hiroaki Nakagawa, Mitsui Petrochemical Industries, Ltd. (Japan)
Masahiro Kondou, Mitsui Petrochemical Industries, Ltd. (Japan)

Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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