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Proceedings Paper

Ultra-clean fabrication techniques
Author(s): Carl Johnson; Abdu Boudour; Eric T. Chase
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Paper Abstract

Current mask fabrication techniques are at their limit for producing masks which are free of soft defects. To provide a consistently higher quality product, an automated process with integrated inspection for process monitoring and control is required. This paper presents some of the design philosophies required to successfully implement such a system and their application in an available system.

Paper Details

Date Published: 3 November 1994
PDF: 10 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191951
Show Author Affiliations
Carl Johnson, QC Optics Corp. (United States)
Abdu Boudour, QC Optics Corp. (United States)
Eric T. Chase, QC Optics Corp. (United States)


Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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