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Proceedings Paper

Application of conventional defect repair technique to phase-shifting masks
Author(s): Katsuhiro Takushima; Hideyuki Jinbo; Taro Saito; Itsuji Ashida; Yoshio Tanaka
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Paper Abstract

We studied phase shifter defect repair techniques which use conventional mask repair tools. This paper describes two repair techniques applicable to phase shifter residue defects on the etch-stop layer of a quartz substrate. These new techniques, which use a conventional Nd:YAG laser and a Focused Ion Beam (FIB) are beam-on-edge and absorber implantation. Beam-on-edge repair removes phase shifter pin-dots by optimally applying an Nd:YAG laser under conventional mask repair conditions. Absorber implantation repair optimizes phase shifter form combining FIB and Nd:YAG laser tools.

Paper Details

Date Published: 3 November 1994
PDF: 10 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191950
Show Author Affiliations
Katsuhiro Takushima, Oki Electric Industry Co., Ltd. (Japan)
Hideyuki Jinbo, Oki Electric Industry Co., Ltd. (Japan)
Taro Saito, Oki Electric Industry Co., Ltd. (Japan)
Itsuji Ashida, Oki Electric Industry Co., Ltd. (Japan)
Yoshio Tanaka, Oki Electric Industry Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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