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Proceedings Paper

Using the Leitz LMS 2000 for monitoring and improvement of an e-beam
Author(s): Carola Blaesing-Bangert; Klaus-Dieter Roeth; Yoichi Ogawa
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Paper Abstract

Kaizen--a continuously improving--is a philosophy lived in Japan which is also becoming more and more important in Western companies. To implement this philosophy in the semiconductor industry, a high performance metrology tool is essential to determine the status of production quality periodically. An important prerequisite for statistical process control is the high stability of the metrology tool over several months or years; the tool-induced shift should be as small as possible. The pattern placement metrology tool Leitz LMS 2000 has been used in a major European mask house for several years now to qualify masks within the tightest specifications and to monitor the MEBES III and its cassettes. The mask shop's internal specification for the long term repeatability of the pattern placement metrology tool is 19 nm instead of 42 nm as specified by the supplier of the tool. Then the process capability of the LMS 2000 over 18 months is represented by an average cpk value of 2.8 for orthogonality, 5.2 for x-scaling, and 3.0 for y-scaling. The process capability of the MEBES III and its cassettes was improved in the past years. For instance, 100% of the masks produced with a process tolerance of +/- 200 nm are now within this limit.

Paper Details

Date Published: 3 November 1994
PDF: 7 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191948
Show Author Affiliations
Carola Blaesing-Bangert, Leica Mikroskopie und Systeme GmbH (Germany)
Klaus-Dieter Roeth, Leica Mikroskopie und Systeme GmbH (Germany)
Yoichi Ogawa, Dai Nippon Screen MFG. Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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