Share Email Print

Proceedings Paper

Phase measurement system with transmitted UV light for phase-shifting mask inspection
Author(s): Haruhiko Kusunose; Hiroyuki Nakae; Junji Miyazaki; Nobuyuki Yoshioka; Hiroaki Morimoto; Keiichi Murayama; Katsuhiro Tsukamoto
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper describes a direct phase measurement system with transmitted UV-light for phase shifting mask (PSM) inspection using a shearing interferometer microscope. Measurements were made with 365 nm monochromatic light of mercury arc lamp. The accuracy of this system is sufficient for the application for phase shifting mask inspection. The measurement results are in good agreement with the calculation based on quartz step height measurement and refractive index. Wafer exposure results of attenuating-type PSM also agree with the phase measurement results.

Paper Details

Date Published: 3 November 1994
PDF: 8 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191941
Show Author Affiliations
Haruhiko Kusunose, Mitsubishi Electric Corp. (Japan)
Hiroyuki Nakae, Mitsubishi Electric Corp. (Japan)
Junji Miyazaki, Mitsubishi Electric Corp. (Japan)
Nobuyuki Yoshioka, Mitsubishi Electric Corp. (Japan)
Hiroaki Morimoto, Mitsubishi Electric Corp. (Japan)
Keiichi Murayama, Mitsubishi Electric Corp. (Japan)
Katsuhiro Tsukamoto, Mitsubishi Electric Corp. (Japan)

Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

© SPIE. Terms of Use
Back to Top