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Proceedings Paper

Manufacturing of half-tone phase-shift masks II: writing and process
Author(s): Hiroyuki Miyashita; Minoru Naitoh; Toshiharu Nishimura; T. Tomita; M. Katoh; Kazuo Suwa; Masa-aki Kurihara; N. Tarumoto; D. Tagaya; S. Ishikita; Hiroyuki Nakamura; Naoya Hayashi
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Paper Abstract

A half-tone phase shift mask process has been developed. The writing and process for normal masks are found to be applicable to HT-PSMs. A dry etch process has been adopted to etch the shifter. Several characteristics of HT-PSMs such as CD uniformity, CD linearity, edge roughness and corner rounding, positional accuracy in the EB process, selectivity in dry etch, pattern profile, durability against cleaning, pelliclization and a blind pattern are evaluated. The process shows a good performance sufficient for first generation 64 MDRAM mask making. The EB writing causes no charge-up problem. The selectivity of HT-shifter to an i-line resist and an new type EB resist in dry etch is satisfactory and the selectivity to a fused silica substrate is more than 300. An exposure test was conducted with our HT-PSM. Coherency factor ((sigma) ) of a stepper is found to strongly affect the defocus range and exposure latitude.

Paper Details

Date Published: 3 November 1994
PDF: 13 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191937
Show Author Affiliations
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Minoru Naitoh, Dai Nippon Printing Co., Ltd. (Japan)
Toshiharu Nishimura, Dai Nippon Printing Co., Ltd. (Japan)
T. Tomita, Dai Nippon Printing Co., Ltd. (Japan)
M. Katoh, Dai Nippon Printing Co., Ltd. (Japan)
Kazuo Suwa, Dai Nippon Printing Co., Ltd. (Japan)
Masa-aki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
N. Tarumoto, Dai Nippon Printing Co., Ltd. (Japan)
D. Tagaya, Dai Nippon Printing Co., Ltd. (Japan)
S. Ishikita, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Nakamura, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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