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Proceedings Paper

Analysis of mask distortion induced by heating during e-beam writing
Author(s): Alberto Moel; Yoshio Gomei
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Paper Abstract

The 3D heat diffusion equation was numerically solved to determine the e-beam writing induced local and global heating and the corresponding distortion for optical and x-ray masks. The beam was 50 kV with maximum current I equals 4 (mu) A for optical masks, and I equals 0.3 (mu) A for x-ray masks. Calculations indicate that the distortion due to the localized temperature rise is negligible for both types of masks. The global distortion for optical masks is on the order of 0.04 micrometers (for I equals 4 (mu) A), and on the order of 0.007 micrometers for x-ray masks (for I equals 0.3 (mu) A) for a dose of 10 (mu) C/cm2 under dense-pattern mask writing conditions.

Paper Details

Date Published: 3 November 1994
PDF: 7 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191931
Show Author Affiliations
Alberto Moel, Toshiba Corp. (Japan)
Yoshio Gomei, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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