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Proceedings Paper

Structural studies of Mo/Si multilayers by EXAFS
Author(s): Shiqiang Wei; Liwen Wu; Jie Bai; Chen Gao; Wenhan Liu
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Paper Abstract

EXAFS was used to investigate the structures of Mo/Si multilayers from 20 angstrom to 3000 angstrom period value. The results show the structural disorder of Mo atom neighbor environment was inreased while the thickness of Mo layer was thinner. For 20 angstrom and 50 angstrom period Mo/Si multilayers, the polycrystalline Mo layer vanish, the intended small period structure were destroyed by interdiffusion. The mixed layer is amorphous MoSi2. EXAFS results confirm that there is a critical difficulty in fabricating small period Mo/Si multilayer with a high reflectivity.

Paper Details

Date Published: 26 October 1994
PDF: 5 pages
Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); doi: 10.1117/12.190781
Show Author Affiliations
Shiqiang Wei, Univ. of Science and Technology of China (China)
Liwen Wu, Univ. of Science and Technology of China (China)
Jie Bai, Univ. of Science and Technology of China (China)
Chen Gao, Univ. of Science and Technology of China (China)
Wenhan Liu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 2364:
Second International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang; Yi-Xin Chen; Shuzheng Mao, Editor(s)

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