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Proceedings Paper

Infrared spectroscopy analysis of porous silicon: a comparison of various preparation conditions
Author(s): Alexander I. Belogorokhov; Lubov I. Belogorokhova; V. A. Karavanskii
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Paper Abstract

The role of silicon hydride species in the photoluminescence intensity behavior of porous silicon (PS) has been studied. The surface coverage was monitored using Fourier Transform Spectroscopy (FTIR). Porous silicon sample sets was prepared by the anodization of p-type (111) Si (10 Ohm X cm) and of n-type (111) Si (0.01 Ohm X cm) under a various current density for a different time of anodization with light illumination and in the dark. We have observed non- monotonous dependencies of PL intensity, IR absorption at Si-Hn stretching and wagging modes as well as of p-type Si and n-type Si versus anodization time and current density. In particular, the levels of IR absorption at the different Si-H modes have no correlation themselves and only wagging mode (628 cm-1) repeat the PL intensity behavior. To our opinion, the photoluminescence may originate from the specific combinations of the particle structure and sizes with the definite surface state conditions of the nanocrystalline porous silicon.

Paper Details

Date Published: 26 October 1994
PDF: 7 pages
Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); doi: 10.1117/12.190744
Show Author Affiliations
Alexander I. Belogorokhov, Institute of Rare Metals (Russia)
Lubov I. Belogorokhova, Moscow State Univ. (Russia)
V. A. Karavanskii, General Physics Institute (Russia)


Published in SPIE Proceedings Vol. 2364:
Second International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang; Yi-Xin Chen; Shuzheng Mao, Editor(s)

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