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Proceedings Paper

High-density optical disk mastering using UV light source
Author(s): Shinichi Katsuda; Kenichi Ishizuka; Naoki Ohmura; Katsu Yamada
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Paper Abstract

For high density optical disk mastering processes, it is important to appropriately select the light source and optical layout as well as to optimize photoresist and exposure method. A g-line type photoresist is preferred for use in the mastering processes, compared with i-line type photoresist. By using the UV light source, the pit width is narrowed down to 0.25 micrometers , which is easily fabricated. Under preferred fabrication exposure power for cross talk and modulation amplitude, excellent jitter values, 8/8 ns, 10.8 ns and 16.9 ns were achieved for quadrupled, quintupled and 6-times density CD-ROMs.

Paper Details

Date Published: 12 October 1994
PDF: 6 pages
Proc. SPIE 2338, 1994 Topical Meeting on Optical Data Storage, (12 October 1994); doi: 10.1117/12.190188
Show Author Affiliations
Shinichi Katsuda, NEC Corp. (Japan)
Kenichi Ishizuka, NEC Corp. (Japan)
Naoki Ohmura, NEC Corp. (Japan)
Katsu Yamada, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 2338:
1994 Topical Meeting on Optical Data Storage
David K. Campbell; Martin Chen; Koichi Ogawa, Editor(s)

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