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Proceedings Paper

OMNISCATR: a high-speed high-resolution three-dimensional scatterometer measures complex scatter interference and diffraction patterns
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Paper Abstract

With OMNISCATR's high resolution and three-dimensional light scatter measurement capabilities, a new method is now available for analyzing surface and material properties such as tooling or etching patterns, contamination, and bulk defects. Scatter data from patterned wafers, sub-micron grit particles, and defective interocular lenses is presented.

Paper Details

Date Published: 7 October 1994
PDF: 13 pages
Proc. SPIE 2260, Stray Radiation in Optical Systems III, (7 October 1994); doi: 10.1117/12.189218
Show Author Affiliations
Raymond J. Castonguay, Breault Research Organization, Inc. (United States)


Published in SPIE Proceedings Vol. 2260:
Stray Radiation in Optical Systems III
Robert P. Breault, Editor(s)

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