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Proceedings Paper

Analog phase holograms by electron-beam lithography
Author(s): Paul D. Maker; Richard E. Muller
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Paper Abstract

Phase holograms have been created on the surface of a thin film of poly-methyl methacrylate (PMMA, Plexiglas) by direct-write electron beam (E-Beam) lithography. The process involves delivering a patterned exposure dose followed by partial development with a strong developer. The patterned dose derives from arbitrary computer-calculated holograms, which must be corrected for the sensitivity characteristic of the PMMA and for the effective point-spread function of the E-Beam.

Paper Details

Date Published: 23 September 1994
PDF: 6 pages
Proc. SPIE 2267, Advanced Microdevices and Space Science Sensors, (23 September 1994); doi: 10.1117/12.187478
Show Author Affiliations
Paul D. Maker, Jet Propulsion Lab. (United States)
Richard E. Muller, Jet Propulsion Lab. (United States)

Published in SPIE Proceedings Vol. 2267:
Advanced Microdevices and Space Science Sensors
James A. Cutts, Editor(s)

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