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Proceedings Paper

Accuracy in integrated circuit dimensional measurements
Author(s): James Potzick
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Paper Abstract

The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The calibration of the standard and the conditions necessary for a valid comparison are discussed. The principles discussed here apply to many other types of measurement as well.

Paper Details

Date Published: 1 July 1994
PDF: 13 pages
Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027409 (1 July 1994); doi: 10.1117/12.187463
Show Author Affiliations
James Potzick, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 10274:
Handbook of Critical Dimension Metrology and Process Control: A Critical Review
Kevin M. Monahan, Editor(s)

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