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Proceedings Paper

Scanning electron microscope metrology
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Paper Abstract

During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various forms of scanning probe microscopies are major microscopical techniques used for submicrometer metrology. New techniques applied to scanning electron microscopy have improved some of the limitations of this technique and time will permit even further improvements. This presentation will review the current state of scanning electron microscope (SEM) metrology in light of many of these recent improvements.

Paper Details

Date Published: 1 July 1994
PDF: 45 pages
Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027405 (1 July 1994); doi: 10.1117/12.187461
Show Author Affiliations
Michael T. Postek Jr., National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 10274:
Handbook of Critical Dimension Metrology and Process Control: A Critical Review
Kevin M. Monahan, Editor(s)

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