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Proceedings Paper

Benchmark procedures for CD measurement system evaluation
Author(s): Kevin M. Monahan
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Paper Abstract

The mathematical background underlying the science of critical dimension metrology is presented at a level suitable for the semiconductor process engineer with little direct experience in the field. Concomitant with this purpose, we make few assumptions and derive many of the concepts from first principles. Understanding the fundamentals provides a basis for further learning and a chart for navigating the sometimes murky waters of the literature. The process engineer can use this work profitably on its own or as a companion document to industrial1 and international standards2.

Paper Details

Date Published: 1 July 1994
PDF: 20 pages
Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027403 (1 July 1994); doi: 10.1117/12.187460
Show Author Affiliations
Kevin M. Monahan, Metrologix, Inc. (United States)


Published in SPIE Proceedings Vol. 10274:
Handbook of Critical Dimension Metrology and Process Control: A Critical Review
Kevin M. Monahan, Editor(s)

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