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Proceedings Paper

CHARM-2: a new tool for characterization of wafer charging in ion- and plasma-based IC processing equipment
Author(s): Wes A. Lukaszek; Joseph Reedholm; Michael I. Current; Nick Tripsas
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Paper Abstract

A new, powerful, easy-to-use tool (CHARM-2) for characterizing wafer charging during wafer processing in ion-based and plasma-based IC processing equipment has been developed. The technique uses dedicated, pre-fabricated 6 inch wafers populated with sensors which monitor the driving forces behind charging damage: peak surface-substrate potentials; peak current densities impinging on a wafer; and total integrated UV dose. The CHARM-2 sensors measure these variables in terms of volts, amps/cm2, and photon flux. The measurement technique consists of pre-conditioning the CHARM-2 wafers on a tester, placing them in the process chamber, performing the given process, and testing the wafer again. Wafer maps of surface-substrate potentials, fluxes of ions, electrons, and UV photons, are generated in a matter of minutes, providing the user with a 'fingerprint' of the charging characteristics of the process/equipment. The CHARM-2 wafers are also re-usable, and thus more economical than test wafer techniques which use oxide breakdown or transistor stress characteristics. The ability to empirically characterize the J-V characteristics of charging sources using the CHARM-2 monitor wafers also opens the way for prediction of failure rates of oxides subjected to specific processes, if the oxide Qbd distributions are known.

Paper Details

Date Published: 16 September 1994
PDF: 9 pages
Proc. SPIE 2336, Manufacturing Process Control for Microelectronic Devices and Circuits, (16 September 1994); doi: 10.1117/12.186791
Show Author Affiliations
Wes A. Lukaszek, Wafer Charging Monitors (United States)
Joseph Reedholm, Reedholm Instruments Co. (United States)
Michael I. Current, Applied Materials, Inc. (United States)
Nick Tripsas, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 2336:
Manufacturing Process Control for Microelectronic Devices and Circuits
Anant G. Sabnis, Editor(s)

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