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Proceedings Paper

Thin film and surface layer processes forming control using electron emission
Author(s): Yuri Dekhtyar; A. Kunitzin; Vladimir Noskov
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Paper Abstract

Physical reasons providing sensitivity of a photoemission current to a thicknesses of a thin film and a doped surface layer are considered. Both a difference between optical properties of a substrata and a film coated on it and dependence of photoelectric work function on electrical active admixture concentration are the main of them. Photoelectron emission has been applied to test objects having the thickness in order to 102 angstroms.

Paper Details

Date Published: 16 September 1994
PDF: 5 pages
Proc. SPIE 2336, Manufacturing Process Control for Microelectronic Devices and Circuits, (16 September 1994); doi: 10.1117/12.186785
Show Author Affiliations
Yuri Dekhtyar, Riga Technical Univ. (Latvia)
A. Kunitzin, Riga Technical Univ. (Latvia)
Vladimir Noskov, Riga Technical Univ. (Latvia)

Published in SPIE Proceedings Vol. 2336:
Manufacturing Process Control for Microelectronic Devices and Circuits
Anant G. Sabnis, Editor(s)

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