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Proceedings Paper

Yield enhancement with particle defects reduction
Author(s): Kiyoshi Mori; Nam Nguyen; Dewey Keeton; Ross Burns
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Paper Abstract

Contamination control is a major issue in VLSI fabrication. Particle control, in particular, is crucial to the success and profitability of the manufacturing process. While most production lines have a particle monitoring system, the direct correlation between defect level and device yield is not always obvious, and therefore prioritizing quick yield improvement efforts can be difficult. This paper discusses a solution with the total particle control system which has provided a practical method for yield enhancement.

Paper Details

Date Published: 14 September 1994
PDF: 8 pages
Proc. SPIE 2334, Microelectronics Manufacturability, Yield, and Reliability, (14 September 1994); doi: 10.1117/12.186772
Show Author Affiliations
Kiyoshi Mori, Sony Microelectronics (United States)
Nam Nguyen, Sony Microelectronics (United States)
Dewey Keeton, Sony Microelectronics (United States)
Ross Burns, Sony Microelectronics (United States)


Published in SPIE Proceedings Vol. 2334:
Microelectronics Manufacturability, Yield, and Reliability
Barbara Vasquez; Hisao Kawasaki, Editor(s)

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