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Proceedings Paper

Reliability improvement of integrated circuits through alkali contamination reduction in dielectric films
Author(s): Carrie Lundquist; Tara Allen; Rafael Delgado; S. Dunnigan; J. Cadenhead; Karl E. Mautz; Jim Peterson; H. Stevens
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Paper Abstract

As geometries continue to shrink, the reduction of alkali ion contamination in integrated circuits is imperative. A Motorola factory established a goal to achieve greater than an order of magnitude reduction in alkali ion levels through characterization and elimination of the sources. Various teams contributed to the overall goal by identifying sources and focusing on reducing or eliminating the alkali ion levels. Reliability improvements have been accomplished over the past three years utilizing this methodology.

Paper Details

Date Published: 14 September 1994
PDF: 6 pages
Proc. SPIE 2334, Microelectronics Manufacturability, Yield, and Reliability, (14 September 1994); doi: 10.1117/12.186755
Show Author Affiliations
Carrie Lundquist, Motorola (United States)
Tara Allen, Motorola (United States)
Rafael Delgado, Motorola (United States)
S. Dunnigan, Motorola (United States)
J. Cadenhead, Motorola (United States)
Karl E. Mautz, Motorola (United States)
Jim Peterson, Motorola (United States)
H. Stevens, Motorola (United States)

Published in SPIE Proceedings Vol. 2334:
Microelectronics Manufacturability, Yield, and Reliability
Barbara Vasquez; Hisao Kawasaki, Editor(s)

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