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Proceedings Paper

Direct-current (DC) magnetron sputtering for optical coatings
Author(s): Paolo Lagana; Carlo Misiano; Enrico Simonetti
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Paper Abstract

The advantages of optical coatings realized by Sputtering versus thermal evaporation by crucible or Electron Gun, are very well known, but this technique is used only partially for dielectric coatings despite of a wide use in semiconductors and microcircuits, due to the slowness of RF Sputtering processes when starting from dielectric targets. This paper describes a DC Reactive Magnetron Sputtering technique from metal target set up at Ce.Te.V. for deposition of multilayer coatings, with cycle times comparable-or even faster-than conventional solution. The advantages of this process consist in obtaining films with high optical and mechanical performances with high repeatability on room temperature substrates. Pumping cycle can thus be faster and dead time for substrates heating and cooling down can be avoided, characteristics which plastic substrates can particularly take advantage of. Performances of the realized coatings on glass and plastic substrates, together with cycle time and material costs, are finally compared to results obtainable by Electron Beam Gun Reactive Deposition.

Paper Details

Date Published: 7 September 1994
PDF: 6 pages
Proc. SPIE 2262, Optical Thin Films IV: New Developments, (7 September 1994); doi: 10.1117/12.185805
Show Author Affiliations
Paolo Lagana, Centro Tecnologie del Vuoto (Italy)
Carlo Misiano, Centro Tecnologie del Vuoto (Italy)
Enrico Simonetti, Centro Tecnologie del Vuoto (Italy)


Published in SPIE Proceedings Vol. 2262:
Optical Thin Films IV: New Developments
James D. Rancourt, Editor(s)

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