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Proceedings Paper

Imaging ellipsometry of optical coatings in situ
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Paper Abstract

A Mueller matrix imaging polarimeter has been developed and demonstrated for characterizing the polarization properties of optical coatings in place in optical systems. This Mueller matrix imaging polarimeter is a form of ellipsometer which measures the polarization characteristics of ray paths through systems in image form. It is a highly versatile instrument capable of making a variety of polarimetric measurements on optical samples or entire optical systems. Two data sets will be presented. The first shows the polarization behavior for example lenses which display the typical Maltese cross variation. The second shows images of polarizing beam splitter behavior as a function of angle of incidence, clearly showing how the plane of polarization as determined by the s- and p-planes rotates for light incident out of the normal plane.

Paper Details

Date Published: 7 September 1994
PDF: 11 pages
Proc. SPIE 2262, Optical Thin Films IV: New Developments, (7 September 1994); doi: 10.1117/12.185784
Show Author Affiliations
Russell A. Chipman, Univ. of Alabama in Huntsville (United States)
J. Larry Pezzaniti, Univ. of Alabama in Huntsville (United States)


Published in SPIE Proceedings Vol. 2262:
Optical Thin Films IV: New Developments
James D. Rancourt, Editor(s)

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