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Proceedings Paper

Roughness and scattering measurements on thin films for UV/VIS applications
Author(s): Angela Duparre; Axel Kiesel; Norbert Kaiser; Horst Truckenbrodt; Uwe Schuhmann
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Paper Abstract

An attempt is presented of a systematic experimental approach to the problem of scattering and roughness modification after deposition of an optical thin film. BK 7 substrates with different surface qualities have been coated with evaporated MgF2, LaF3 and magnetron sputtered SiO2 and Nb2O5 films as representatives of low index/high index columnar structured and structureless films, respectively. Investigations by total integrated scattering (TIS) and angle resolved scattering (ARS) at 633 nm and 325 nm as well as atomic forced microscopy (AFM) demonstrate the possibility of quite different effects of scattering and roughness modification to occur.

Paper Details

Date Published: 7 September 1994
PDF: 12 pages
Proc. SPIE 2262, Optical Thin Films IV: New Developments, (7 September 1994); doi: 10.1117/12.185778
Show Author Affiliations
Angela Duparre, Fraunhofer Institution for Applied Optics and Precision Engineering (Germany)
Axel Kiesel, Fraunhofer Institution for Applied Optics and Precision Engineering (Germany)
Norbert Kaiser, Fraunhofer Institution for Applied Optics and Precision Engineering (Germany)
Horst Truckenbrodt, Technical Univ. Ilmenau (Germany)
Uwe Schuhmann, JENOPTIK Technology GmbH (Germany)


Published in SPIE Proceedings Vol. 2262:
Optical Thin Films IV: New Developments
James D. Rancourt, Editor(s)

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