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Proceedings Paper

Low-energy high-flux reactive ion-assisted deposition of oxide optical coatings: performance, durability, stability, and scalability
Author(s): Walter T. Pawlewicz; Thomas R. Culver; Michael W. Chiello; John H. Zachistal; Sherman R. Walters; D. A. Allen
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Paper Abstract

Advanced deposition technologies produce optical coatings with state-of- art-optical performance, improved durability, stability and lifetime and sometimes improved scalability to large optics and small-optics volume coating. This paper examines a low-energy, high-flux reactive ion assist process developed at Itek during the past four years from this perspective. The process is introduced at the fundamental level of ion and atom energetics and arrival ratios, with both inert and reactive gases. Earlier high-voltage, low-current approaches are contrasted. The manifold benefits of coating densification, improved stoichiometry, low-temperature processing and in situ substrate cleaning are described. Process implementation in mid-sized and large coating chambers is pictorially illustrated. Inexpensive retrofit is realized. Very low absorption, enhanced durability and precision mechanical stress control are demonstrated with selected highlights of recent Itek optical coating experiences. Examples of especially-interesting optics recently coated are shown. Competing coating technologies are compared.

Paper Details

Date Published: 7 September 1994
PDF: 12 pages
Proc. SPIE 2262, Optical Thin Films IV: New Developments, (7 September 1994); doi: 10.1117/12.185776
Show Author Affiliations
Walter T. Pawlewicz, Litton Itek Optical Systems (United States)
Thomas R. Culver, Litton Itek Optical Systems (United States)
Michael W. Chiello, Litton Itek Optical Systems (United States)
John H. Zachistal, Litton Itek Optical Systems (United States)
Sherman R. Walters, Litton Itek Optical Systems (United States)
D. A. Allen, Litton Itek Optical Systems (United States)


Published in SPIE Proceedings Vol. 2262:
Optical Thin Films IV: New Developments
James D. Rancourt, Editor(s)

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