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Proceedings Paper

Electrochromism in oxyfluoride thin films
Author(s): Andris Azens; A. Gutarra; B. A. Stjerna; Claes-Goeran Granqvist; J. Gabrusenoks; Andrejs R. Lusis
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Paper Abstract

Oxyfluoride films based on W and Ti were prepared by reactive sputtering in plasmas containing O2 + CF4. The deposition rate was large, particularly when chemical sputtering was promoted by heating the target. The films could show large charge insertion/extraction, high coloration efficiency, and good cycling durability.

Paper Details

Date Published: 9 September 1994
PDF: 8 pages
Proc. SPIE 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, (9 September 1994); doi: 10.1117/12.185386
Show Author Affiliations
Andris Azens, Uppsala Univ. (Sweden)
A. Gutarra, Uppsala Univ. (Sweden)
B. A. Stjerna, Uppsala Univ. (Sweden)
Claes-Goeran Granqvist, Uppsala Univ. (Sweden)
J. Gabrusenoks, Univ. of Latvia (Latvia)
Andrejs R. Lusis, Univ. of Latvia (Latvia)


Published in SPIE Proceedings Vol. 2255:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII
Volker Wittwer; Claes G. Granqvist; Carl M. Lampert, Editor(s)

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