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Proceedings Paper

Thermochromism of metal-doped VO2 films deposited by dual-target sputtering
Author(s): Ping Jin; Masato Tazawa; Kazuki Yoshimura; Takeshi Miki; K. Igarashi; Sakae Tanemura
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Paper Abstract

Thermochromic VO2 films were prepared by reactive magnetron sputtering under various conditions of substrate temperature, total sputter pressure and oxygen flow ratio and characterized by XRD, RBS, AFM and spectrophotometry. Films with VO2 single phase were formed from a fairly low substrate temperature of 300 degree(s)C by precisely controlling the oxygen flow ratio. The use of vanadium-nucleated substrates significantly improved the crystallinity of VO2. Tungsten doped V1-xWxO2 films with x equals 0 approximately 0.26 were formed by dual-target sputtering and the thermochromism of films was evaluated. The tungsten doping linearly hysteresis loop width.

Paper Details

Date Published: 9 September 1994
PDF: 8 pages
Proc. SPIE 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, (9 September 1994); doi: 10.1117/12.185384
Show Author Affiliations
Ping Jin, National Industrial Research Inst. of Nagoya (Japan)
Masato Tazawa, National Industrial Research Inst. of Nagoya (Japan)
Kazuki Yoshimura, National Industrial Research Inst. of Nagoya (Japan)
Takeshi Miki, National Industrial Research Inst. of Nagoya (Japan)
K. Igarashi, National Industrial Research Inst. of Nagoya (Japan)
Sakae Tanemura, National Industrial Research Inst. of Nagoya (Japan)


Published in SPIE Proceedings Vol. 2255:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII
Volker Wittwer; Claes G. Granqvist; Carl M. Lampert, Editor(s)

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