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Proceedings Paper

Computational design of SiO-based spectral selective radiating film
Author(s): Masato Tazawa; Ping Jin; Yutaka Tai; Takeshi Miki; Kazuki Yoshimura; Sakae Tanemura
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Paper Abstract

Silicon-monoxide (SiO) film on aluminum (Al) substrate is known as one of the spectral selective radiating materials that utilizes selective infrared emission through the atmospheric window (8-13 micrometers ). Nevertheless, the radiative cooling power of them is rather low comparing to that of black body which is ranging from 60 to 100 W/m2, depending on the model of the atmosphere and the humidity. In other words, the sky radiator must have a considerably large are film with homogeneous thickness. This is the reason why it is difficult to put the radiative cooling idea to practical use. To attempt a solution of this problem, we have examined some silicon composite films and/or their multilayers on aluminum substrate by numerical calculation. The main results are following: (1) (SiO + Si)/SiO film with adequate thickness shows the best result to obtain the high power radiative cooling. The radiative cooling power at room temperature (300 K) is expected to be about 20% larger, and the obtainable temperature drop to be about 10% larger than that of SiO single film on Al. (2) The difficulty of deposition of the coating with large area and homogeneous thickness can be overcome by use of porous SiO stacked film whose optical properties are not so influenced by the film thickness. If we couple the above mentioned materials with cover films of high reflectance for solar radiation and high transmittance in atmospheric window region, the radiative cooling may be more realistic even under direct daylighting.

Paper Details

Date Published: 9 September 1994
PDF: 11 pages
Proc. SPIE 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, (9 September 1994); doi: 10.1117/12.185365
Show Author Affiliations
Masato Tazawa, National Industrial Research Institute of Nagoya (Japan)
Ping Jin, National Industrial Research Institute of Nagoya (Japan)
Yutaka Tai, National Industrial Research Institute of Nagoya (Japan)
Takeshi Miki, National Industrial Research Institute of Nagoya (Japan)
Kazuki Yoshimura, National Industrial Research Institute of Nagoya (Japan)
Sakae Tanemura, National Industrial Research Institute of Nagoya (Japan)


Published in SPIE Proceedings Vol. 2255:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII

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