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Proceedings Paper

Development of an injection-controlled high-power XeF(C->A) excimer laser
Author(s): Shigeru Yamaguchi; Thomas Hofmann; C. Brent Dane; Roland A. Sauerbrey; William L. Wilson; Frank K. Tittel
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Paper Abstract

The performance of a scaled, repetitively pulsed injection controlled XeF (C-A) laser system is reported. A 1 Hz electron beam pumped XeF (C-A) laser system produced 0.8 J per pulse with an intrinsic efficiency of 1.5 percent. Details of a compact halogen compatible flow loop is reported. Various unstable resonator geometries were evaluated. A minimum beam divergence of 150 microrad (full angle) corresponding to a three times diffraction-limited beam was determined from far field measurements.

Paper Details

Date Published: 1 June 1990
PDF: 9 pages
Proc. SPIE 1225, High-Power Gas Lasers, (1 June 1990); doi: 10.1117/12.18475
Show Author Affiliations
Shigeru Yamaguchi, Rice Univ. (United States)
Thomas Hofmann, Rice Univ. (United States)
C. Brent Dane, Rice Univ. (United States)
Roland A. Sauerbrey, Rice Univ. (United States)
William L. Wilson, Rice Univ. (United States)
Frank K. Tittel, Rice Univ. (United States)


Published in SPIE Proceedings Vol. 1225:
High-Power Gas Lasers
Petras V. Avizonis; Charles Freed; Jin J. Kim; Frank K. Tittel, Editor(s)

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