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Proceedings Paper

Long-pulse (5 us) e-beam pumped XeF laser
Author(s): Michael C. Cates
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Paper Abstract

A 5 microsec e-beam pumped XeF laser is described. Low concentrations of xenon and fluorine donor (NF3 or F2) were required to reduce losses for long-pulse operation at low (27 kW/cc) pump rates. Better performance was obtained using NF3 as the fluorine donor. The intrinsic efficiency was found to be flat over the laser pulse length, and averaged 1.1 percent. The laser output consisted of only the 353 nm line. A Rigrod treatment yielded a net gain 0.5 percent/cm.

Paper Details

Date Published: 1 June 1990
PDF: 10 pages
Proc. SPIE 1225, High-Power Gas Lasers, (1 June 1990); doi: 10.1117/12.18471
Show Author Affiliations
Michael C. Cates, Maxwell Labs., Inc. (United States)


Published in SPIE Proceedings Vol. 1225:
High-Power Gas Lasers
Petras V. Avizonis; Charles Freed; Jin J. Kim; Frank K. Tittel, Editor(s)

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