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Proceedings Paper

Surface processing by high-power soft x-ray irradiation
Author(s): Valery Ju. Znamenskiy; O. B. Anan'in; J. Bykovsky; Ju. V. Eremin; I. K. Novikov; A. A. Zhuravlev
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Paper Abstract

The principle of high power soft X-ray source design using laser plasma and waveguide X-ray optics is described. The radiation parameters of pulse and high-repetitive sources are reported. The experiments on X-ray induced effect on crystalline heteroepitaxial ZnSe/GaAs films are described.

Paper Details

Date Published: 7 September 1994
PDF: 12 pages
Proc. SPIE 2207, Laser Materials Processing: Industrial and Microelectronics Applications, (7 September 1994); doi: 10.1117/12.184708
Show Author Affiliations
Valery Ju. Znamenskiy, Moscow Engineering Physics Institute (Russia)
O. B. Anan'in, Moscow Engineering Physics Institute (Russia)
J. Bykovsky, Moscow Engineering Physics Institute (Russia)
Ju. V. Eremin, Moscow Engineering Physics Institute (Russia)
I. K. Novikov, Moscow Engineering Physics Institute (Russia)
A. A. Zhuravlev, Moscow Engineering Physics Institute (Russia)


Published in SPIE Proceedings Vol. 2207:
Laser Materials Processing: Industrial and Microelectronics Applications
Eckhard Beyer; Maichi Cantello; Aldo V. La Rocca; Lucien Diego Laude; Flemming O. Olsen; Gerd Sepold, Editor(s)

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