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Proceedings Paper

Fabrication of waveguide grating coupler with double-corrugation by ion beam etching technology
Author(s): Yajun Li; Mai Xu; Olivier M. Parriaux
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Paper Abstract

This paper reports the method and technology on the fabrication of grating coupler with double-corrugation on BK7 glass waveguide for operation at 780 nm wavelength. Twice ion beam etching has technologically made possible the fabrication of high-efficiency waveguide grating coupler.

Paper Details

Date Published: 5 August 1994
PDF: 3 pages
Proc. SPIE 2321, Second International Conference on Optoelectronic Science and Engineering '94, (5 August 1994); doi: 10.1117/12.182030
Show Author Affiliations
Yajun Li, Changchun Institute of Physics (China)
Mai Xu, Changchun Institute of Physics (China)
Olivier M. Parriaux, Swiss Ctr. for Electronics and Microtechnology (Switzerland)


Published in SPIE Proceedings Vol. 2321:
Second International Conference on Optoelectronic Science and Engineering '94
Wang Da-Heng; Anna Consortini; James B. Breckinridge, Editor(s)

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