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Proceedings Paper

Postprocessing of nm-period multilayer structures
Author(s): A. A. Gorbunov; Wolfgang Pompe; Reiner Dietsch; Hermann Mai; Michael Panzner; Rhena Krawietz; B. Wehner
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Paper Abstract

We study effects of macro- and micro-postprocessing of multilayered synthetic Ni/C film structures. The structures have nm-period 1D modulation of concentration of the major components. Initially low surface and interface roughness of such structures makes them advantageous for application as a new type of substrates in nanofabrication technologies and for information storage with nm-resolution. Metastability of microstructure and high residual stresses favor the use of the structures themselves as a media for fine-scale processing.

Paper Details

Date Published: 28 July 1994
PDF: 10 pages
Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180974
Show Author Affiliations
A. A. Gorbunov, Max-Planck-Gesellschaft (Germany)
Wolfgang Pompe, Max-Planck-Gesellschaft (Germany)
Reiner Dietsch, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
Hermann Mai, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
Michael Panzner, Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (Germany)
Rhena Krawietz, Technische Univ. Dresden (Germany)
B. Wehner, Technische Univ. Dresden (Germany)

Published in SPIE Proceedings Vol. 2213:
Nanofabrication Technologies and Device Integration
Wolfgang Karthe, Editor(s)

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