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Proceedings Paper

Super resolution lithography using a direct-write laser pattern generator
Author(s): Roelof W. Wijnaendts van Resandt; Christian F.J. Buchner
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Paper Abstract

This paper shows that a direct write laser has completely incoherent properties, even though the light used for illumination is coherent. As a result of this fact it has twice the resolving power of that of a coherent imaging system. Due to the extended depth of focus steep resist walls can be achieved using a direct write system. To demonstrate this exposure on 1.5 micrometers and 2.0 micrometers thick photoresist were made. A multiple- exposure technique is proposed to produce structures consisting of 0.25 micrometers lines and spaces, although the smallest structure which can be exposed is 0.75 micrometers .

Paper Details

Date Published: 28 July 1994
PDF: 6 pages
Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180969
Show Author Affiliations
Roelof W. Wijnaendts van Resandt, Heidelberg Instruments Mikrotechnik (Germany)
Christian F.J. Buchner, Heidelberg Instruments Mikrotechnik (Germany)


Published in SPIE Proceedings Vol. 2213:
Nanofabrication Technologies and Device Integration
Wolfgang Karthe, Editor(s)

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