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Proceedings Paper

Transfer of submicron period gratings by conventional chromium mask photolithography
Author(s): Henry Vuilliomenet; Lucien G. Falco; Olivier M. Parriaux; Michel Neviere
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Paper Abstract

Conventional chromium mask transfer can be used for the photolithographic transfer of high spatial frequency gratings at nonnormal incidence. A systematic study brings the tolerance on the transfer parameters such as proximity, angle of incidence, and line/space ratio.

Paper Details

Date Published: 28 July 1994
PDF: 7 pages
Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180959
Show Author Affiliations
Henry Vuilliomenet, CSEM (Switzerland)
Lucien G. Falco, CSEM (Switzerland)
Olivier M. Parriaux, CSEM (France)
Michel Neviere, Univ. d'Aix-Marseille (France)


Published in SPIE Proceedings Vol. 2213:
Nanofabrication Technologies and Device Integration
Wolfgang Karthe, Editor(s)

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