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Proceedings Paper

Sub-micrometer patterning of strip-antiresonant-reflecting-optical waveguide structures by e-beam direct writing
Author(s): J. Gehler; Andreas H. Braeuer; Wolfgang Karthe; Norbert Haase
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Paper Abstract

Antiresonant reflecting optical waveguide (ARROW) structures in strip configuration have been designed and fabricated on a SiON- SiO2-Si-wafer. The ARROW structures have been calculated by combining the effective index method with the transfer matrix approach and their field distribution by FEM. The width of the reflectors corresponds to the (lambda) /4 layers for the lateral component of the wavevector and, therefore, strips of 0.2 to 0.6 micrometers width are patterned by e-beam direct writing and etched into SiON by RIE. As an application a directional coupler consisting of two parallel strip-ARROWs is realized on the same substrate. The coupling length is a periodic function of the waveguide separation because of the leaky wave mechanism in waveguiding. Remote coupling up to 93 micrometers is demonstrated experimentally.

Paper Details

Date Published: 28 July 1994
PDF: 7 pages
Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180958
Show Author Affiliations
J. Gehler, Fraunhofer-Institut fuer Angewandte Optik (Germany)
Andreas H. Braeuer, Fraunhofer-Institut fuer Angewandte Optik (Germany)
Wolfgang Karthe, Fraunhofer-Institut fuer Angewandte Optik (Germany)
Norbert Haase, Fraunhofer-Institut fuer Microelectronic Circuits and Systems (Germany)


Published in SPIE Proceedings Vol. 2213:
Nanofabrication Technologies and Device Integration
Wolfgang Karthe, Editor(s)

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