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Proceedings Paper

Fabrication and characterization of submicron gratings written in planar silica glass with a focused ion beam
Author(s): Jacques Albert; Bernard Malo; Francois Bilodeau; Derwyn C. Johnson; Kenneth O. Hill; Ian M. Templeton; John L. Brebner
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Paper Abstract

Groove patterns with submicron lateral sizes and depths of several hundreds of nanometers have been defined in silica glass surfaces by focused ion beam implantation and differential wet etching in hydrofluoric acid solutions. Nonperiodic arbitrary patterns can be defined and variable depth achieved through local ion dose control. The fabrication of diffractive optical elements for excimer lasers in the ultraviolet is described.

Paper Details

Date Published: 28 July 1994
PDF: 11 pages
Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180949
Show Author Affiliations
Jacques Albert, Communications Research Ctr. (Canada)
Bernard Malo, Communications Research Ctr. (Canada)
Francois Bilodeau, Communications Research Ctr. (Canada)
Derwyn C. Johnson, Communications Research Ctr. (Canada)
Kenneth O. Hill, Communications Research Ctr. (Canada)
Ian M. Templeton, National Research Council of Canada (Canada)
John L. Brebner, Univ. de Montreal (Canada)


Published in SPIE Proceedings Vol. 2213:
Nanofabrication Technologies and Device Integration
Wolfgang Karthe, Editor(s)

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