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Proceedings Paper

Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films
Author(s): Bradley J. Pond; Tu Du; J. Sobczak; Charles K. Carniglia
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Paper Abstract

Films produced by reactive-dc-magnetron sputtering are generally dense and homogeneous. Thus their optical properties are similar to those of ion-beam-sputtered films and distinct from the properties of the more porous electron-beam evaporated films. In this paper, the measured results of the dispersive refractive index n and extinction coefficient k are presented for single- layer films of SiO2, Al2O3, HfO2, Ta2O5, Nb2O5, and TiO2 produced by the three processes. For some of the magnetron-sputtered films, it was necessary to modulate the dc power supply in order to suppress the electrical arcing at the target.

Paper Details

Date Published: 28 July 1994
PDF: 10 pages
Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); doi: 10.1117/12.180926
Show Author Affiliations
Bradley J. Pond, S. Systems Corp. (United States)
Tu Du, S. Systems Corp. (United States)
J. Sobczak, S. Systems Corp. (United States)
Charles K. Carniglia, S. Systems Corp. (United States)


Published in SPIE Proceedings Vol. 2114:
Laser-Induced Damage in Optical Materials: 1993
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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