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Proceedings Paper

UV laser patterning of polymers: in-situ and nondestructive evaluation of incubation phenomena by photothermal techniques
Author(s): Zhouling Wu; Eckart Matthias; S. S. Xue; Y. Zhang
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Paper Abstract

The optical absorption coefficient of some polymer materials can be increased by exposure to low fluence UV laser radiation. This phenomenon, known as UV light incubation, has been demonstrated to be a powerful tool for surface patterning of organic polymers. In this paper we report our recent progress in understanding the incubation phenomenon and its application to laser patterning by using various photothermal techniques. The data reported include the in- situ monitored incubation/ablation dynamics and the absolute change in optical absorption and thermal diffusivity of the incubated area. Besides these nondestructive evaluation experiments, some of the incubated sites are exposed to high fluence laser radiation. The results show that fine structures with submicron spatial resolution can be achieved without the necessity to focus tightly the ablation laser beam.

Paper Details

Date Published: 28 July 1994
PDF: 1 pages
Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); doi: 10.1117/12.180917
Show Author Affiliations
Zhouling Wu, Wayne State Univ. (United States)
Eckart Matthias, Freie Univ. Berlin (Germany)
S. S. Xue, Laval Univ. (Canada)
Y. Zhang, Max-Plank-Institut fuer Biophysikalische Chemie (Germany)


Published in SPIE Proceedings Vol. 2114:
Laser-Induced Damage in Optical Materials: 1993
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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