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Proceedings Paper

Electrostatic reduction of particulates for laser resistant hafnia coatings
Author(s): Mark G. Miller; Robert Chow; Gary E. Loomis
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Paper Abstract

We have reduced by 50% particulate defect density of hafnia coatings deposited onto silicon substrates through the use of electric fields, physical barriers and deposition rates. In an effort to reduce the number of hafnia particulates deposited onto silicon wafers, parallel plate electrodes were placed on either side of the evaporant plume. The particulate level was determined as the deposition rate was varied from 0.75 angstroms/sec to 12 angstroms/sec. Then, parallel plate electrodes were placed on either side of the plume as a way of electrostatically deflecting hafnia particulates away from the substrates. Later a single plate electrode was used in conjunction with a physical barrier placed over the hearth. The results of our study indicate that minimal defects occur when a parallel plate electric field is applied in conjunction with a fast deposition rate. Using a screen as a physical barrier, and/or a single electrode had little or no effect. This data may be useful in the manufacture of multilayer optical coatings with high laser damage thresholds.

Paper Details

Date Published: 28 July 1994
PDF: 7 pages
Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); doi: 10.1117/12.180894
Show Author Affiliations
Mark G. Miller, Lawrence Livermore National Lab. (United States)
Robert Chow, Lawrence Livermore National Lab. (United States)
Gary E. Loomis, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 2114:
Laser-Induced Damage in Optical Materials: 1993
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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