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Proceedings Paper

Laser-focused atomic deposition
Author(s): Jabez J. McClelland; R. E. Scholten; Rajeev Gupta; Robert J. Celotta
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Paper Abstract

We have demonstrated the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated, with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm X 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of- principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.

Paper Details

Date Published: 21 July 1994
PDF: 4 pages
Proc. SPIE 2125, Laser Techniques for Surface Science, (21 July 1994); doi: 10.1117/12.180858
Show Author Affiliations
Jabez J. McClelland, National Institute of Standards and Technology (United States)
R. E. Scholten, National Institute of Standards and Technology (United States)
Rajeev Gupta, National Institute of Standards and Technology (United States)
Robert J. Celotta, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 2125:
Laser Techniques for Surface Science
Hai-Lung Dai; Steven J. Sibener, Editor(s)

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