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Proceedings Paper

Highly sensitive positive resists for holography
Author(s): Kunihiro Ichimura; Yasushi Ohe
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Paper Abstract

New visibile llight sensitive positive type resists have been developed. The chemistry is based on the hydrolysis of polymers catalyzed by acid which is generated on sensitized photodecomposition of diphenyliodonium (DPI) salt. Dimethoxybenzhydryl methacrylate (DMOBHMA)-phenyl methacrylate (PhMA) copolymer was the best acid sensitive polymer tested, producing photoresists with sensitivity to an argon ion laser light and good holographic properties.

Paper Details

Date Published: 1 May 1990
PDF: 3 pages
Proc. SPIE 1212, Practical Holography IV, (1 May 1990); doi: 10.1117/12.17969
Show Author Affiliations
Kunihiro Ichimura, Research Institute for Polymers and Textiles (Japan)
Yasushi Ohe, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1212:
Practical Holography IV
Stephen A. Benton, Editor(s)

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