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Proceedings Paper

Molecular beam epitaxy (MBE) HgCdTe flexible growth technology for the manufacturing of infrared photovoltaic detectors
Author(s): Jose M. Arias; John G. Pasko; Majid Zandian; Jagmohan Bajaj; Lester J. Kozlowski; Roger E. DeWames; William E. Tennant
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Paper Abstract

In this paper we present p-on-n heterostructure HgCdTe photovoltaic device data that illustrates the high performance and flexibility in band gap control of the molecular beam epitaxy (MBE) technology. This flexibility demonstration was carried out by growing material for operation in the following cut-off wavelength ((lambda) co) ranges of interest: LWIR [(lambda) co(77 K) equals 9-11 micrometers ], MLWIR [(lambda) co(77 K) equals 6-7 micrometers ], and VLWIR [(lambda) co(40 K) equals 20 micrometers ]. Detailed analyses of the current-voltage characteristics of these diodes as a function of temperature show that their dark currents are diffusion-limited down to 80 K, 50 K, and 30 K for the MLWIR, LWIR, and VLWIR photodiodes, respectively. In general, the RoA device values were uniform for the three band gap ranges when operating under diffusion limited conditions. The planar MBE HgCdTe technology has been further validated with the successful fabrication and operation of 64 X 64 hybrid FPAs.

Paper Details

Date Published: 13 July 1994
PDF: 15 pages
Proc. SPIE 2228, Producibility of II-VI Materials and Devices, (13 July 1994); doi: 10.1117/12.179662
Show Author Affiliations
Jose M. Arias, Rockwell International Science Ctr. (United States)
John G. Pasko, Rockwell International Science Ctr. (United States)
Majid Zandian, Rockwell International Science Ctr. (United States)
Jagmohan Bajaj, Rockwell International Science Ctr. (United States)
Lester J. Kozlowski, Rockwell International Science Ctr. (United States)
Roger E. DeWames, Rockwell International Science Ctr. (United States)
William E. Tennant, Rockwell International Science Ctr. (United States)


Published in SPIE Proceedings Vol. 2228:
Producibility of II-VI Materials and Devices
Herbert K. Pollehn; Raymond S. Balcerak, Editor(s)

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