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Proceedings Paper

Micro-Fresnel lens fabricated by electron-beam lithography
Author(s): Shigeru Aoyama; Noriyoshi Horie; Tsukasa Yamashita
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Paper Abstract

Novel electron-beam lithography techniques for fabricating micro Fresnel lens are proposed. A high performance blazed-micro Fresnel lens with a diffraction efficiency of 65% and an RMS wavefront aberration ofO.03A was obtained.

Paper Details

Date Published: 1 May 1990
PDF: 9 pages
Proc. SPIE 1211, Computer and Optically Formed Holographic Optics, (1 May 1990); doi: 10.1117/12.17936
Show Author Affiliations
Shigeru Aoyama, Omron Corp. (Japan)
Noriyoshi Horie, Omron Corp. (Japan)
Tsukasa Yamashita, Omron Corp. (Japan)

Published in SPIE Proceedings Vol. 1211:
Computer and Optically Formed Holographic Optics
Ivan Cindrich; Sing H. Lee, Editor(s)

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