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Proceedings Paper

E-beam and optical reticle generation
Author(s): C. Neil Berglund
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Paper Abstract

An overview is provided of the technologies and architectures incorporated into commercial pattern generators as they apply to current and expected state-of-theart reticle requirements, and a fundamental assessment and comparison is made of the various approaches being used. The assessments are made with respect to pattern accuracy (pattern placement and feature size), data handling, and throughput; then projected over time in the light of key technical trends and requirements. While at any particular time the comparison of different machine architectures and technologies is heavily influenced by the effectiveness with which they are being implemented, from a fundamental perspective it is shown that raster scan systems have advantages in accuracy and data handling, and vector scan systems have an advantage in throughput. Based on projections of machine technical capabilities it is concluded that both architectures are capable of meeting reticle needs through and beyond the 256M generation of technologies, and that the major challenge is data handling. Most of the necessary performance improvements for all machines are expected to come from processing improvements and from data-path and printing strategy optimization (including multipass printing for error averaging) rather than only from printing-path architectural or hardware improvements.

Paper Details

Date Published: 1 January 1994
PDF: 14 pages
Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 1027309 (1 January 1994); doi: 10.1117/12.177441
Show Author Affiliations
C. Neil Berglund, Northwest Technology Group (United States)


Published in SPIE Proceedings Vol. 10273:
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review
Gregory K. Hearn, Editor(s)

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